Samsung launches innovation campus programme at Durban University of Technology
Electronics manufacturer Samsung has launched its Samsung Innovation Campus (SIC) programme at the Durban University of Technology (DUT) to establish a strategic partnership that will help equip the next generation with future-ready technology skills to enhance student employability.
The technology sector is struggling to find talent, with 118 000 digital and information and communications technology job positions in South Africa unfilled, including thousands of entry-level roles that are suitable for young professionals starting their careers.
The SIC programme, hosted within the DUT Business School, aims to upskill 60 young people in Fourth Industrial Revolution (4IR) technologies by providing training in high-demand fields, including coding and programming in Python, as well as AI.
The programme will also enable DUT students to become entrepreneurs in technology who are able to develop AI-driven projects and solve real-world problems, Samsung says.
Over the next three years, the SIC programme aims to bridge the divide between academic learning and industry requirements, ensuring graduates possess the practical skills needed to secure jobs in the tech sector.
The advent of 4IR has increased the need for graduates with varied skills to drive technological innovations that address societal and industrial challenges.
“This collaboration will ensure that our curriculum equips our young people with skills that will help them to become employable. This partnership with Samsung allows us to contribute to the skills development of our young people in KwaZulu-Natal,” says DUT Business School director Professor Pfano Mashau.
Partnerships such as this one are essential in achieving South Africa’s educational goals. This collaboration bridges theory and practice. Through this partnership, students will gain exposure to cutting-edge technologies and develop the practical skills required to navigate and shape the digital economy, the partners say.
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