International vacuum solutions provider Pfeiffer Vacuum has released two new gas analysis products onto the market, namely the Sputter Process Monitor (SPM) 220 and the High Pressure Analyser (HPA) 220.
The products are based on the company’s proven mass spectro-meter technology, Prisma-Plus, in combination with a dry compressing HiPace turbo pump-ing station, and are used to monitor and document vacuum processes, such
as coating archi-tectural glass or thin-film solar cells.
The SPM 220 and the HPA 220 are available in atomic mass unit (amu) ranges of 1 amu to 100 amu and 1 amu to 200 amu, while the HPA 200 is also available in the 1 amu to 300 amu range.
The SPM 220 has a specially developed ion source, which enables a direct connection between the analyser and the process chamber. This enables the vacuum conditions of sputter processes and similar applications to be monitored instantaneously up to a pressure of 10–2 mbar.
An additional opening system enables the pressure range to expand up to 10 mbar.
The HPA 220 is available with three different gas inlet valves, both manually and electropneumatically operable, and its modular design is a versatile vacuum solution for gas analysis in the high vacuum to 50 mbar pressure range.
Both products are equipped with a number of digital and analog inlets and outlets that enable a simple connection to control systems.
The newly developed operating software has a clearly laid out user interface, which can be modified for special process requirements, as well as simple documentation of measurement results.